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Light, metal, and few-nanometer-precision fabrication

Joel K.W. Yang (IMRE and SUTD)
Wed, 29/01/2014 - 4:00pm to 5:00pm
Graphene Seminar Room (S16 level 6)
Event Type: 


The field of Nanoplasmonics focuses on the phenomenon of light interaction with metal structures that support resonances at optical frequencies. The collective oscillations of charges in these structures give rise to resonances and enhanced fields that depend strongly on the precise geometry, metal gap sizes, and surrounding dielectric media. Due to the significant dimensional dependence of nanoplasmonic structures down to the few-nanometer scale, highly precise nanofabrication capabilities are imperative. In this talk we will discuss some advances in nanofabrication processes involving electron-beam lithography [1], self-assembly [2], and chemical synthesis [3] to control features in these nanostructures that affect their interaction with light. Examples include the control of nanostructure sizes to produce color prints [4], gap sizes for strong localization of light [5], atomic-scale grain boundaries, and nanoscale contacts between metal nanostructures and a dielectric substrates as sources of damping. 


[1] H. Duan, H. Hu, H.K. Hui, Z. Shen, J.K.W. Yang, “Free-standing sub-10 nm nanostencils for the definition of gaps in plasmonic antennas”, Nanotechnology 2013, 24, 185301
[2] M. Asbahi, K.T.P. Lim, F. Wang, H. Duan, N. Thiyagarajah, V. Ng, and J.K.W. Yang , “Directed Self-Assembly of Densely Packed Gold Nanoparticles”, Langmuir 2012, 28, 6725-17216
[3] H. Hu, Y.A. Akimov, H. Duan, X. Li, M. Liao, R. Lee, L. Wu, H. Chen, H. Fan, P. Bai, P.S. Lee, J.K.W. Yang and Z. Shen*, “Photoluminescence via gap plasmons between single silver nanowires and a thin gold film”, Nanoscale 2013, 5, 12086-12091
[4] K. Kumar, H. Duan, R. Hegde, S. Koh, J. Wei, J.K.W. Yang, “Printing Color at the Optical Diffraction Limit”, Nature Nanotechnology 2012 7, 557–561
[5] H. Duan, A.I. Fernandez-Dominguez, M. Bosman, S.A. Maier, J.K.W. Yang, “Nanoplasmonics: Classical Down To The Nanometer Scale”, Nano Letters 2013, 12 (3), 1683-1689

Speaker's biography

Joel K.W. Yang is an Assistant Professor at the Singapore University of Technology and Design. He received his SM (2005) and PhD (2009) degrees from the Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science. During his PhD, he worked on superconducting nanowire single-photon detectors, and developed capability for sub-10-nm patterning using electron-beam lithography and block-copolymer self assembly. He holds a joint appointment at the Institute of Materials Research and Engineering (IMRE) of A*STAR where he continues to lead the efforts on Nanoplasmonics, and Nanopatterning. He is recognized for pioneering color printing at the highest-possible resolutions (100,000 dpi) using scattering off metal nanostructures. His research interests include sub-10-nm resolution lithography, directed self assembly, and in interfacing plasmonic with electronics. He was the recipient of the MIT Technology Review TR35@Singapore award, and the Singapore Young Scientist Award.


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